Atomic layer deposition of nanostructured materials /
Atomic layer deposition of nanostructured materials /
edited by Nicola Pinna, Mato Knez.
- Weinheim : Chichester : Wiley-VCH ; John Wiley [distributor], 2011.
- 1 online resource (1 volume)
Includes bibliographical references and index.
Front Matter -- Introduction to ALD. Theoretical Modeling of ALD Processes / Charles B Musgrave -- Step Coverage in ALD / Sovan Kumar Panda, Hyunjung Shin -- Precursors for ALD Processes / Matti Putkonen -- Sol₆Gel Chemistry and Atomic Layer Deposition / Guylhaine Clavel, Catherine Marichy, Nicola Pinna -- Molecular Layer Deposition of Hybrid Organic₆Inorganic Films / Steven M George, Byunghoon Yoon, Robert A Hall, Aziz I Abdulagatov, Zachary M Gibbs, Younghee Lee, Dragos Seghete, Byoung H Lee -- Low-Temperature Atomic Layer Deposition / Jens Meyer, Thomas Riedl -- Plasma Atomic Layer Deposition / Erwin Kessels, Harald Profijt, Stephen Potts, Richard van de Sanden -- Nanostructures by ALD. Atomic Layer Deposition for Microelectronic Applications / Cheol Seong Hwang -- Nanopatterning by Area-Selective Atomic Layer Deposition / Han-Bo-Ram Lee, Stacey F Bent -- Coatings on High Aspect Ratio Structures / Jeffrey W Elam -- Coatings of Nanoparticles and Nanowires / Hong Jin Fan, Kornelius Nielsch -- Atomic Layer Deposition on Soft Materials / Gregory N Parsons -- Application of ALD to Biomaterials and Biocompatible Coatings / Mato Knez -- Coating of Carbon Nanotubes / Catherine Marichy, Andrea Pucci, Marc-Georg Willinger, Nicola Pinna -- Inverse Opal Photonics / Davy P Gaillot, Christopher J Summers -- Nanolaminates / Adriana V Szeghalmi, Mato Knez -- Challenges in Atomic Layer Deposition / Markku Leskel̃ -- Index.
9783527639915 3527639918 9783527639939 3527639934 9783527639922 3527639926
10.1002/9783527639915 Wiley InterScience http://www3.interscience.wiley.com
Chemical vapor deposition.
Nanostructured materials.
TECHNOLOGY & ENGINEERING--Mechanical.
Chemical vapor deposition.
Nanostructured materials.
Electronic books.
TS695 / .A86 2011
621.38152
Includes bibliographical references and index.
Front Matter -- Introduction to ALD. Theoretical Modeling of ALD Processes / Charles B Musgrave -- Step Coverage in ALD / Sovan Kumar Panda, Hyunjung Shin -- Precursors for ALD Processes / Matti Putkonen -- Sol₆Gel Chemistry and Atomic Layer Deposition / Guylhaine Clavel, Catherine Marichy, Nicola Pinna -- Molecular Layer Deposition of Hybrid Organic₆Inorganic Films / Steven M George, Byunghoon Yoon, Robert A Hall, Aziz I Abdulagatov, Zachary M Gibbs, Younghee Lee, Dragos Seghete, Byoung H Lee -- Low-Temperature Atomic Layer Deposition / Jens Meyer, Thomas Riedl -- Plasma Atomic Layer Deposition / Erwin Kessels, Harald Profijt, Stephen Potts, Richard van de Sanden -- Nanostructures by ALD. Atomic Layer Deposition for Microelectronic Applications / Cheol Seong Hwang -- Nanopatterning by Area-Selective Atomic Layer Deposition / Han-Bo-Ram Lee, Stacey F Bent -- Coatings on High Aspect Ratio Structures / Jeffrey W Elam -- Coatings of Nanoparticles and Nanowires / Hong Jin Fan, Kornelius Nielsch -- Atomic Layer Deposition on Soft Materials / Gregory N Parsons -- Application of ALD to Biomaterials and Biocompatible Coatings / Mato Knez -- Coating of Carbon Nanotubes / Catherine Marichy, Andrea Pucci, Marc-Georg Willinger, Nicola Pinna -- Inverse Opal Photonics / Davy P Gaillot, Christopher J Summers -- Nanolaminates / Adriana V Szeghalmi, Mato Knez -- Challenges in Atomic Layer Deposition / Markku Leskel̃ -- Index.
9783527639915 3527639918 9783527639939 3527639934 9783527639922 3527639926
10.1002/9783527639915 Wiley InterScience http://www3.interscience.wiley.com
Chemical vapor deposition.
Nanostructured materials.
TECHNOLOGY & ENGINEERING--Mechanical.
Chemical vapor deposition.
Nanostructured materials.
Electronic books.
TS695 / .A86 2011
621.38152